High Temperature Resistant Custom Processing Fused Silica Quartz Glass Plate with High Light Transmittance
Detalles del producto
| Temperatura de trabajo: | 1150 ℃ | Composición de materiales: | SiO2> 99.99% |
|---|---|---|---|
| Transmitancia de luz: | > 92% | Espesor: | 0.5-100 mm |
| Densidad: | 2.2g/cm3 | Dureza: | Morse 6.5 |
| Resaltar |
High Temperature Resistant Quartz Glass Plate,Custom Processing Fused Silica Plate,High Light Transmittance Quartz Sheet |
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Descripción del Producto
Aspectos destacados del producto
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